buff process module, SUBSTRATE PROCESSING APPARATUS and buff pad cleaning method

抛光处理组件、基板处理装置及抛光垫清洗方法

Abstract

The invention provides a buff process module, a substrate processing apparatus and a buff pad cleaning method. The buff process module includes: a buff table on which a processing target object is mounted; a buff head that holds a buff pad for applying a predetermined process to the processing target object; a buff arm that supports and swings the buff head; a dresser for dressing the buff pad; and a cleaning mechanism that is disposed between the buff table and the dresser and is for cleaning the buff pad.
本发明提供抛光处理组件、基板处理装置及抛光垫清洗方法。抛光处理组件具有:抛光台,该抛光台用于设置处理对象物;抛光头,该抛光头用于保持抛光垫,该抛光垫用于对所述处理对象物进行规定的处理;抛光臂,该抛光臂对所述抛光头进行支承并摆动;修整件,该修整件用于对所述抛光垫进行修整;以及清洗机构,该清洗机构配置在所述抛光台与所述修整件之间,用于对所述抛光垫进行清洗。

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